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고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
Wafer level large-size molybdenum disulfide preparation furnace
This equipment is a wafer level large-size
molybdenum disulfide preparation device designed based on CVD principles. It
includes a three-zone tube furnace, a specially designed furnace tube and a set
of supporting gas paths. The equipment can uniformly release the reaction gas
into the furnace tube through a specially designed pipeline to ensure the
consistency and uniformity of the product on the back-end wafer. It is the best
choice for molybdenum disulfide preparation experiments.
Technical parameters:
Product model |
CY-O1200-120III-IC-3Z-MoS2 |
Furnace tube material |
High purity quartz |
Furnace tube size |
External large quartz tube φ120mm x1000mm Internal small quartz tube φ25mm x820mm
x7 |
Temperature zone length |
Three heating zone 200mm+200mm+200mm |
Temperature control accuracy |
±1℃ |
Temperature curve |
Independent temperature control in three
temperature zones, each temperature zone can be set with 30-segment time
temperature curve |
Operating temperature |
0~1150℃ |
Heating rate |
≤10℃/min |
Intake system |
Three-channel mass flow meter Ar gas 0~500sccm N2 gas 0~200sccm H2 gas 0~200sccm Equipped with seven channels of gas
separation, gas mixing gas path. |
Furnace pipe flange |
Stainless steel water-cooled flange,
equipped with KF16 vacuum interface, mechanical vacuum gauge and stainless
steel needle valve |
Power requirements |
AC 220V 50Hz 4kW |
Control mode |
7-inch touch screen |
Vacuum pump |
Dual stage rotary vane vacuum pump |
Vacuum |
Theoretical ultimate vacuum degree
10^-1Pa |