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공정장비

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Electron beam evaporation coating equipment with auxiliary ion source

모델명 :
제품 견적문의

상품상세정보

The electron beam evaporation coating equipment is mainly used to prepare various conductive films, semiconductor films, ferroelectric films, optical films, micro-nano device micro-processing, electron microscope sample pretreatment, etc. It is especially suitable for vapor deposition of various refractory metal materials. It can be used not only for hard substrates such as glass and silicon wafers, but also for coating on flexible substrates such as PDMS, PTFE, and PI.

Technical parameters:

Operating conditions

Ambient   temperature

5℃～40℃

Power supply

380V

Power

≤20KW

Water pressure

≤2.5bar

Vacuum chamber size

Evaporation chamber size

φ500×H500(mm)

transition warehouse

φ280×H300(mm)

Electron gun

1 set of new electron gun, 6-hole crucible

Ion source

1 set of Kaufman ion source K08

Sample turntable

Sample size: ≤φ150mm, the sample can be rotated, and the distance between the sample and the electron gun can be adjusted up and down (the shape of the sample holder is designed according to user requirements), the heating temperature is ≤500℃

System vacuum

Ultimate vacuum

after 12-24 hours of baking, continuous pumping gas≤5x10-5Pa

Ultimate vacuum

Pumping rate: Vacuum degree≤5x10-4Pa within 40 minutes from atmospheric pressure

Leakage rate of the system

Leakage rate of the system: the leakage rate of the whole machine is less than or equal to1×10-8Pa.L/s, After stopping the pump for 12 hours, measuring the vacuum degree of the vacuum chamber less than or equal to 10Pa.

Vacuum pumping system

TM160 film thickness meter is used for monitoring.

Coating monitoring

TM160 film thickness meter is used for monitoring

The unevenness of the coating thickness

≤3%