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Horizontal high vacuum three-target magnetron sputtering coater alloy thin films

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제품 견적문의

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The three-target magnetron sputtering coater can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, etc. Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for preparing material thin films in the laboratory. The three-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customizability. The magnetron target is 2 inches, and customers can choose it according to the size of the substrate to be plated; the power supply is two 500W DC power supplies and one 300W RF power supply. The DC power supply can be used for the preparation of metal films, and the two targets can meet the needs of multi-layer or multiple coatings. The coater has two high-precision mass flow meters. If the customer has other needs, the gas path of up to four mass flow meters can be customized to meet the needs of complex gas environment construction; the instrument is equipped with an advanced turbomolecular pump group as standard, and the ultimate vacuum can reach 1.0E-5Pa. At the same time, other types of molecular pumps are available for purchase. The gas route of the molecular pump is controlled by multiple solenoid valves, which can open the cavity to take out the sample without turning off the pump, greatly improving your work efficiency. This product can be equipped with an all-in-one industrial computer to control the system. The computer program can realize most functions such as the control of the vacuum pump group and the control of the sputtering power supply, which can further improve your experimental efficiency.

Technical parameters:

Product   name

Horizontal   high vacuum three-target magnetron sputtering coater

Product   model

CY-MSH325-III-DCDCRF-SS

Power   supply voltage

AC220V，50Hz

Complete   power

6KW

System   vacuum

≦5×10-4Pa

Sample   stage

Dimensions

φ150mm

Heating   temperature

≦850℃

Temperature   control accuracy

±1℃

Adjustable   speed

≦20rpm

Magnetron   Sputtering Target

Target   size

Diameter   Φ50.8mm, thickness ≦3mm

Cooling   mode

Circulating   water cooling

Water   flow size

Not   less than 10L/Min

Quantity

3

Vacuum   chamber

Cavity   size

Diameter   φ325mm

Cavity   material

SUU304   stainless steel

Observation   window

Diameter   φ100mm

Opening   method

Top   opening

Gas   control

1   mass flow meter is used to control Ar flow, with a range of 200SCCM

Vacuum   system

Equipped   with 1 molecular pump system, gas pumping speed 600L/S

Film   thickness measurement

Optional   quartz crystal film thickness meter, resolution 0.10 Å

Sputtering   power supply

Equipped   with DC power supply, power 500W*2 RF power supply 300W

Control   system

CYKY   self-developed professional control system

Equipment   dimensions

570mm×1040mm×1700mm

Equipment   weight

250kg