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High vacuum 4-inch three-target magnetron sputtering coater for Silicon carbide film

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The three-target magnetron sputtering coater can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, etc. Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for preparing material thin films in the laboratory. The three-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customization. The magnetron target is 4 inches, and customers can choose it according to the size of the substrate to be plated; the power supply is three 500W RF power supplies, which can be used for the preparation of non-metallic thin films, and the three targets can meet the needs of multi-layer or multiple coatings. The coater has a high-precision mass flowmeter. If the customer has other needs, the gas path of up to four mass flowmeters can be customized to meet the needs of complex gas environment construction; the instrument is equipped with an advanced turbomolecular pump group, and the ultimate vacuum can reach 1.0E-4Pa. At the same time, other types of molecular pumps are available for purchase. The gas path of the molecular pump is controlled by multiple solenoid valves, which can realize the opening of the cavity to take out the sample without turning off the pump, greatly improving your work efficiency. This product can be equipped with an all-in-one industrial computer to control the system. The computer program can realize most functions such as the control of the vacuum pump group and the control of the sputtering power supply, which can further improve your experimental efficiency.

Technical parameters:

Product Name

Triple Target Magnetron Sputtering Coater

Model

CY-MSH1000-III-RFRFRF-SS

Sample Stage

Size

632*750

Rotational speed

1-20rpm adjustable

Magnetron Sputtering Target

Quantity

4"×3

Cooling mode

Water cooling

Water chiller

Circulating water chiller with flow rate   of 10L/min

Vacuum Chamber

Chamber size

Dia.1000mm*800mm

Chamber material

Stainless steel

Watch window

Dia.100mm

Opening mode

Front door open

Mass Flow Meter

Single channel, 0-200SCCM for Ar

Vacuum System

Backing pump

Rotary vane pump, 8.3L/s

Secondary pump

Molecular pump, 300L/s

Ultimate vacuum

1.0E-3Pa

Pumping interface

ISO160

Exhaust interface

K16F

Vacuum measurement

Compound vacuum gauge

Power supply

AC220V, 50/60Hz

RF Power Supply

Quantity

RF power supply*3

Max output power

0-500W

Other parameters

Supply voltage

AC220V,50Hz

Total power

8KW

Overall size

2020*1785*1860mm

Total Weight

About 500kg