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공정장비
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Three target magnetron sputtering coating instrument with cleaning function
상품상세정보
The three target magnetron sputtering
coater is equipped with two magnetron targets and two sets of DC power
supplies, which can be used to coat multilayer conductive metal films. At
the same time, the equipment has two parts: a main chamber and a transition
chamber. The transition chamber is equipped with a magnetic push rod, and a
vacuum gate valve is installed between the two chambers; The user can load
samples in the transition chamber while performing sputtering work in the main
chamber, and perform vacuum pre-pumping. After the sputtering in the main
chamber is completed, the sample can be pushed into the sample stage of the
main chamber through the magnetic push rod. Such a design can reduce the
number of vacuum pumping times in the main chamber, which not only effectively
saves time, but also ensures a better local vacuum and effectively improves the
quality of the coating.
Three target magnetron sputtering
coater technical tarameters：
|
Working Voltage |
l VAC 220, 60Hz |
|
|
Sputtering Vacuum Chamber |
l Dimension: ~ φ325xH510mm l Material: 304 stainless steel l Inner wall processing:
electrolytic polishing l Sealing method: Fluorine rubber
seal l Viewport (window):
~4'' (100mm) with shutter |
|
|
Sample Holder |
l Center bottom setting
sample holder, with one shutter l Sample holder: Dia. 150mm l Rotary speed:
0~20rpm adjustable l Heating temperature: RT~
500oC |
|
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Magnetron Sputtering Gun |
l Quantity: 3 sets l Adjustable angle -45°~45° l Sputtering orientation downwards l Target dimension: diameter
2'', thickness max.3mm |
|
|
Quartz Crystal Monitor |
l Channel numbers: One-channel l Accuracy: 0.1Ã l Measurement speed: 100mS-1S
adjustable l Measurement range: 500 000Ã
(Aluminum as a reference) l Standard sensor quartz crystal:
6MHz |
|
|
Vacuum System |
Backing Pump |
l Double-stage rotary vane pump l Pumping rate: 1.1L/s |
|
Molecular Pump |
l Pumping rate: 600 L/s l Rated rotating speed: 27000rpm l Starting time: <5min l Cooling method: water cooling l Vacuum degree: 5*10-4Pa |
|
|
Composite Vacuum Gauge |
l Resistance gauge +
ionization gauge l Measuring range: 10-5Pa
~ 105 Pa |
|
|
DC Power Supply |
l Quantity: 2 sets l Output power: 0~500W l Output voltage: 0～600V l Maximum output current: 1A l Starting time: 1~10s |
|
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RF power supply |
l Quantity: 1 set l Output power: 0~500W l RF frequency: 13.56 MHz l Matching method: automatch l Reflected power: ≦100W l Power stability: ±0.1% |
|
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Mass Flow Controller |
l One-channel MFC for Ar gas l Measuring range: 0~200sccm |
|
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Water Cooler |
l Flow rate: 10L/min l Power: 0.1KW l Cooling power: 50W/℃ l Tank capacity: 9L |
|
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Control |
l PLC automatic control |
|
|
Transition chamber |
l The chamber size will be for max.
4inch wafers. l Equipped with one compact
molecular pump group l Backing pump: VRD-4, pumping
speed: 1.1L/s l Model of molecular pump: TG60F l Pumping speed of molecular pump:
60L/s |
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TEL : 02-565-7077 FAX : 02-563-7033 E-mail : jungmun@jungmun-science.co.kr
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