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Three target upper magnetron sputtering coating

모델명 :
제품 견적문의

상품상세정보

Three target magnetron sputtering coating instrument is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customization. The equipment can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc. DC power supply can be used for the preparation of metal films, RF power supply can be used for the preparation of non-metallic films, and the three targets can meet the needs of multi-layer or multiple coating. Compared with similar equipment, the three-target magnetron sputtering coating instrument is not only widely used, but also has the advantages of small volume and easy operation. It is an ideal equipment for preparing material films in the laboratory.

magnetron sputtering coating technical parameters :

Three target magnetron sputtering coating   machine (DC power supply + RF power supply)

Sample table

Sputtering mode

Sputtering orientation upwards, the sample stage is located above the   sputtering target；

Center top setting sample holder, with one shutter

Sample holder

φ150mm

Control accuracy

±1℃

Heating range

Room   temperature～500℃

Adjustable speed

1-20rpm   adjustable

Target base distance adjustable

The distance   between the target and the substrate can be adjusted electrically

 

 

Magnetron target gun

Target plane

Circular plane   target

Sputtering   vacuum

10Pa～0.2Pa

Target   diameter

50～50.8mm

Target   thickness

2～5mm

Note: if the target is magnetic material (such as Fe, Co, Ni), the   thickness cannot be more than 1.5mm, and strong magnetic sputtering gun is required,   will need extra charge.

Insulation voltage

>2000V

Quantity

2 inches*3；with shutters   for each gun

Cable   specification

SL-16

Target head   temperature

≦65℃

 

Vacuum chamber

Inner wall   treatment

Electrolytic polishing

Chamber size

φ300mm × 350mm

Chamber   material

304 stainless   steel

Observation   window

Quartz window, diameter φ100mm with shutter

Sealing method

Viton seal

Open method

Top opening, cylinder auxiliary support

 

 

 

 

 

 

 

 

 

 

 

Gas control system

Flow control

3-way mass   flow meter:

Oxygen: range   0～100SCCM

Argon gas:   range 0～200SCCM

Nitrogen: range 0～500SCCM

(Note: In order to achieve a higher oxygen-free   environment, the vacuum chamber must be cleaned with high-purity inert gas at   least 3 times.)

Gas type

Argon, nitrogen, oxygen, and other inert gases

Control valve   type

Solenoid valve

Control valve   static state

Normally   closed

Measuring   linearity

±1.5% F.S

Measurement   repeatability

±0.2% F.S

Measuring   response time

≤8 seconds（T95）

Working   pressure range

0.3MPa

Valve body   pressure

3MPa

Working   temperature

（5～45）℃

Body material

Stainless steel 316L

Valve body   leakage rate

1×10-8Pa.m3/s

Pipe joints

1/4″Compression fitting

Input and   output signal

0～5V

Power supply

±15V（±5%）（＋15V  50mA,    －15V 200mA）

Overall   dimensions (mm)

130 (width) ×   102 (height) × 28 (thickness)

Communication   Interface

RS485 MODBUS protocol

DC power supply

Power supply

500W

Output voltage

0～600V

Maximum output   current

1A

Timing length

65000 S

Starting time

1～10 S

Quantity

2 sets

RF power supply

Power supply

500W

Power output   range

0W-500W, with auto match

Maximum   reflected power

100W

RF frequency

13.56MHz+/-0.005%   stability

Power   stability

≤5W

Harmonic   component

less than   -50dbc

Quantity

1 set