Smile, Smart, Speed
고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
Compact powder PVD coating system
Compact powder PVD coating system
Compact powder PVD coating system consists
of 2" water cold magnetron sputtering head and vibration stage. The
particles will jump on the vibration stage during coating and form a core-shell
structure. The coater will be useful for preparing special powder for 3D
printing and solid state electrolyte powders.
Compact powder PVD coating system is a
small powder coating system consisting mainly of a 2-inch magnetron sputtering
head and a vibrating sample stage. The powder is vibrated on the vibrating
sample stage, and is coated on the surface of the powder by sputtering to form
a core-shell structure. DC magnetron sputtering is suitable for metallic
materials on powder surfaces. RF magnetron sputtering is suitable for coating
non-metallic materials or carbon on the surface of materials.
Compact powder PVD coating system
specifications:
Product model |
Compact powder PVD coating system |
Features |
1. Surface coating of powder material:
using magnetron sputtering, the powder material is tumbling on the vibrating
sample table during sputtering to achieve uniform coating on the surface of
the powder. 2. the device is small and can be used in
the glove box, can handle sample sensitive materials |
Technical Parameters |
1. Input voltage: 220 VAC 50/60Hz 2. Power output: 1600 VDC 250 W 3. Maximum current: 150 mA. 4. Sputtering head: 2 inch angle
adjustable sputtering head 5. Vibration sample stage: Sample table vibration frequency can be
adjusted: 6-33Hz Sample stage diameter: 50mm Recommended sample amount: < 500 mg Recommended particle size: 1 ~ 1000um Quartz chamber size: 165 mm OD.×150 mm ID×250
mm H 6. Vacuum degree: (1) 1.0E-2 Torr (with mechanical pump),
can sputter Au, Ag, Pt, Cu, Mo and other targets (2) 1.0E-5 Torr (with molecular pump),
can sputter Al, Mg, Li, Lr, Ti, Zn and other easily oxidized metal
targets, the maximum vacuum can reach < 4.0E-6 Torr (molecular pump system
vacuum pumping time 12 hours , the chamber is baked) 7. CE certification |
Product specifications |
Dimensions: L460 × W330 × H810mm
Net weight: 20Kg |
Precautions |
Warning: 1. Sputtering head is connected with
high-voltage power supply, and protective gloves must be worn during
operation. 2. Before sputtering, the target, sputter
head, substrate and sample stage must be cleaned. It needs to be cleaned with
sandpaper and ethanol. Al or Ni target must be cleaned and treated every
time. Note: powder samples must be dried and
dispersed |