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Desktop double head magnetron sputtering coating machine

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Desktop double head magnetron sputtering coating machine

This equipment is a double target magnetron sputter coating machine, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc. it can also be used to prepare SEM samples in laboratory.

This equipment is a double target magnetron sputter coater machine, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc.this double target magnetron sputter coater can also be used to prepare SEM samples in laboratory.

It adopts high vacuum stainless steel chamber, front door opening design, and quartz observation window on the door, which is convenient for the observation and recording of the experiment. At the same time, the equipment is equipped with a rotary heating sample table, which can effectively improve the film uniformity and film quality. A set of baffle plate is installed on the top cover, and the two targets can be switched by rotating the baffle plate to realize multilayer coating.

This equipment needs to be used together with high vacuum molecular pump group. Users can choose imported brand small molecular pump to further save installation area.

At the same time, the model can be equipped with film thickness meter components, which can monitor the film thickness in real time and provide reliable parameters for the experimental process.

double target magnetron sputter coater technical parameters:

product name

Desktop double head magnetron sputtering   coating machine

Product number

CY-MSZ180-I-RF-SS

sample stage

Dimensions

φ100mm

Heating temperature

≦500℃

Adjustable speed

≦20rpm

Magnetic target gun

Equipped with a two-inch magnetic control   target, target size: diameter 50.8mm, thickness ≦3mm

vacuum chamber

Cavity size

φ180mm X215mm

observation window

omnidirectionally transparent

Cavity material

SUU304 stainless steel

Opening method

Removable top cover

Vacuum system

Backing pump

Low noise bipolar rotary vane pump

Molecular pump

Low noise and high pumping speed   turbomolecular pump

Vacuum measurement

Composite vacuum gauge, range: 10-5~105Pa

Air extraction interface

KF16

Air extraction interface

KF40

Exhaust interface

KF16

System vacuum

1.0×10-4Pa

Power supply

AC 220V 50/60Hz

Pumping rate

The pumping speed of the molecular pump   is 600L/s, and the pumping speed of the backing pump is 1.1L/s.

Power configuration

Number of power supplies

A set of RF power supply

Output Power

500W

Other parameters

Supply voltage

AC220V,50Hz

Total power

2kW

Overall size

550mm X 350mm X400mm