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Dual-target magnetron sputtering coater (with RF&DC power supply) CY-MSH300-II-RFDC-SS

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Dual-target magnetron sputtering coater (with RF&DC power supply) CY-MSH300-II-RFDC-SS

Dual head magnetron sputtering coater equipment is a special laboratory coating instrument developed by our company. The magnetron sputtering coater equipment can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

Dual head magnetron sputtering coater equipment is a special laboratory coating instrument developed by our company. The magnetron sputtering coater equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.

After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory.

Dual-target magnetron sputtering coater technical parameters:

Power supply

AC220V, 50Hz

Whole power

6KW

Ultimate vacuum

5x10-4Pa

Sample table parameters

Size

φ150mm

Heat temp

500℃ max.

Temp control

±1℃

Rotation speed

1-20rpm adjustable

Magnetron sputtering head parameters

Quantity

Size:2 inches x2

Cooling mode

Water cooled, flow 10L/min required

Water chiller

10L/min Circulating water cooling

Vacuum chamber

Size

φ300mm x 340mm H

Material

SUS

Watch window

φ100mm

Opening mode

open type, easy to replace target

Gas flow controller

One-channel,200sccm Ar;

Vacuum pump

A molecular pump system, pumping 600L/S

Quartz vibrating film thickness gauge

One set, resolution 0.10 angstrom

Sputter power source

DC power supply:500W, Suitable for preparing metal films

RF power supply:500W, Suitable for preparing non - metallic films

Operating mode

All-in-one computer operation

Overall Dimensions

1090mm x 900mm x 1250mm

Total weight

350kg