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Dual target magnetron sputtering and thermal evaporation composite coating machine

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제품 견적문의

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Dual target magnetron sputtering and thermal evaporation composite coating machine

CY-MSE325S-2TA1S magnetron sputter coater & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope).

CY-MSE325S-2TA1S magnetron sputter coater & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope).

The equipment is mainly composed of stainless steel vacuum chamber, magnetron sputtering target, evaporation source, rotary heating sample table, vacuum pump unit, vacuum measurement gauge, air intake system and control system.

Features of PVD coating equipment:

a. Touch screen operation, temperature control meter detection. Digital parameter interface and automatic operation mode provide users with an excellent research and development platform;

b. The vacuum chamber is made of 304 stainless steel with observation window and baffle. Beautiful shape, fine workmanship, excellent vacuum performance. The main sealing flange is CF series high vacuum sealing flange. Each interface of vacuum chamber is sealed with rubber seal ring, which has excellent vacuum performance and can effectively ensure the coating quality;

c. The target is located at the bottom of the cavity, and the target is upward. The sample table has the function of heating and rotating, which can make the coating effect more uniform;

d. The vacuum acquisition system adopts two-stage vacuum pump group. The backing pump is mechanical pump with high pumping speed, which can effectively reduce the time from atmospheric pressure to low vacuum. The main pump is turbine molecular pump, which has high pumping speed and faster vacuum acquisition speed. The overall vacuum acquisition system is clean and fast.

Technical parameters of PVD coating equipment:

Model

CY-MS500S-2TA1S

Sample table

Size

150mm Dia.

Heating

≤500℃

Temp control

±1℃

Rotation speed

1-20r/min

Magnetron sputter head

Quantity

2-inch ×2

Cooling mode

Water cooled

Thermal evaporation

evaporator source

Tungsten wire basket

Max temp

1500℃

Thermocouple

S type  

Vacuum chamber

Size

300mmDia.× 300mmH

Watch window

100mm Dia.

Open mode

Front opening door

 

Material

304 SUS

Vacuum system

Mechanical pump

Rotary vane pump

Extraction interface

KF16

Pumping

1.1L/s

Molecular pump

Turbo molecular pump

Extraction interface

CF150

Pumping

600L/s

Exhaust interface

KF40

Vacuum gauge

Resistance gauge + ionization gauge

Power supply

AC;220V 50/60Hz

Ultimate vacuum degree

1.3x10-4Pa

Sputter power supply

DC power supply

1 set

Output power

≤1000W

Output voltage

≤600W

Response time

＜5ms

RF power supply

1 set

Output power

≤1000W

Power stability

≤5W

RF stability

 

±0.005%

RF frequency

13.56MHz

Film thickness gauge

Resolution

±0.03Hz

Accuracy

±0.5%

Speed

100~1000ms

Upper range limit

 

50000

Water cooled system

Tank volume

9L

Flow

10L/min

Gas system

Flowmeter type

MFC(mass flow meter)

Range

200sccm

Gas type

Ar

 

Other

Input supply

AC220V,50Hz

Size

1400x750x1300mm

Total power

4kw（host+vacuum pump）

Weight

295kg