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Double-head magnetron sputtering coater with bias power supply

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Double-head magnetron sputtering coater with bias power supply

Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. this magnetron sputtering coater can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.

Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. this magnetron sputtering coater can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.

Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time.

In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory.

Technical Parameters of Double target magnetron sputtering coater:

product name

Double target magnetron sputtering coater

Product number

CY-MSV300- II-DCRF-SS

Item

Detail

Voltage

AC220V，50Hz

Power

3KW

Ultimate vacuum

10-6 torr

Sample stage

 Size：dia.150mm

 Heating temperature：MAX.500℃

lAccuracy：±1℃

 Speed：1~20rpm   adjustable

Magnetron sputtering head

Number: two ,2-inch

Cooling mode: Water cooling,10L / min   flow rate

Vacuum Chamber

Size：dia.300mm ×   300mm H

Material：stainless   steel

Observation window：dia.100mm

Opening mode：Open   top, easy to replace the target

Gas flow controller

2 channels: Ar, N2;Range 0-100sccm

Vacuum pump

Molecular pump system, pumping speed:   600L/S

Film thickness gauge

Quartz vibrating film thickness gauge,   resolution: 0.10 μM

Sputtering power supply

One DC power supply, 1000W, suitable for   preparing metal film

One RF power supply, 500W, suitable for   non-metallic coating

Operation mode

Panel button operation

Dimensions

1400mm × 750mm × 1300mm

Weight

300 KG