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Programmable single chamber magnetron sputtering coater

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Programmable single chamber magnetron sputtering coater

Programmable single chamber magnetron sputtering coater is widely used in semiconductor, LED, photovoltaic and other industries. It is mainly used for the preparation of various metal, semiconductor and dielectric materials thin film, and can meet the needs of scientific research and small batch production.

Programmable single chamber magnetron sputtering coater is a single-chamber structure, mainly composed of sputtering vacuum chamber, magnetron sputtering target, ion bombardment, revolution substrate, optical heating system, sputtering power supply, working gas path, vacuum acquisition system, installation machine, vacuum measurement, water cooling, alarm system and control system,etc.

The system is controlled by IPC and PLC, with two modes of automatic and manual control. In addition to put the sample, all other processes are realized on the touch screen. It provides man-machine operation interface such as vacuum system, sputtering process setting, filling and venting system, etc. On the IPC, you can set parameters through the formula, to implement the procedure process and equipment parameter Settings.

Programmable single chamber magnetron sputtering coater

Sputtering chamber vacuum limit

≤8.0×10-6Pa

Vacuum recovery time

The system was pumped from atmosphere to 1.0×10-3 Pa within 15minutes

Uniformity

Film thickness nonuniformity≤±5%; nonuniformity between the slices≤±5%; Inhomogeneity between batches≤±5%

Sputtering vacuum chamber

The cylindrical structure, size 800mmx250mm

Magnetron sputtering system

Permanent magnet target 4, target size 6 inches;

One imported power supply (rf or dc pulse optional)；

Sputtering rate: 0.5 ~ 5 angstrom per second (target Al)

Revolution base plate

6 inches 6 pieces (4 inches 12 pieces or 3 inches 16 pieces);

The substrate revolution is 3~15 revolution/min, continuously adjustable, and the common rotation composite worktable is optional

Light heating system

Sample heating temperature: room   temperature to 250 ℃, continuous adjustable;

Substrate temperature nonuniformity: ≤±10℃;

Temperature control method is PID   automatic temperature control and digital display, equipped with imported temperature control meter.

Working gas channel

2 channel mass flow controller (MFC)

Gas pump composition

Cryopump (imported), Roots dry pump set, air gate valve (imported), pipes

Vacuum measurement

System vacuum, working vacuum and backing vacuum was precisely measured by 2 vacuum gauges (imported); the vacuum degree can be displayed visually on the touch screen of industrial computer; the vacuum degree of the sputtering coating process can be monitored accurately.

Control system

The entire system can be controlled by IPC (touch screen) and PLC (imported)

Floor Space

Main set

1500×1000mm2

electric control cabinet

700×700mm2(one)