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고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
High Power Desktop Magnetron Plasma Sputtering Coater with 3 Rotary Target
High Power Desktop Magnetron Plasma Sputtering Coater with 3 Rotary Target
The instrument is a three-target magnetron coating machine with three two-inch magnetron target heads. The tilt angle of the target head and the distance from the sample stage are adjustable.
Product Description
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The instrument is a three-target magnetron coating machine with three two-inch magnetron target heads. The tilt angle of the target head and the distance from the sample stage are adjustable. In order to facilitate the experimental operation, the coating machine is also equipped with an electric baffle, which can directly control the opening and closing of the baffle through the display screen. The coating machine is equipped with a 100W RF power supply. By manually switching the output lines, three target heads can share one power supply (not simultaneous), thereby enabling operation of plating multiple or multiple layers of membranes in a single experiment.
The device is compact and well designed and can be placed on the desktop, making it ideal for lab purchases.
This set of configuration does not contain a vacuum system, customers can choose the high vacuum system that meets the requirements according to your own needs.
Specifications
Product name Three-target RF magnetron sputtering coating machine
Product model CY-VTC-3RF
Supply voltage AC220V, 50Hz
RF power supply 0~100W continuously adjustable
Maximum power 200W
Chamber material stainless steel
Chamber size O.D.φ300mm x 300mm
Magnetron sputtering head 3x2”
Magnetron target parameter Adjustable tilt angle 0~25°
The distance from the target to the sample stage is 50~80mm
Each target head is equipped with an electric baffle
Cooling method is water-cooled, need to be equipped with 10L/min water chiller
Sample stage parameters Size: φ185mm
Speed: 1~10rpm adjustable
Heating up to 500°C
Temperature control accuracy: ±1°C