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High Power Desktop Magnetron Plasma Sputtering Coater with 3 Rotary Target

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High Power Desktop Magnetron Plasma Sputtering Coater with 3 Rotary Target

The instrument is a three-target magnetron coating machine with three two-inch magnetron target heads. The tilt angle of the target head and the distance from the sample stage are adjustable. 

Product Description

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The instrument is a three-target magnetron coating machine with three two-inch magnetron target heads. The tilt angle of the target head and the distance from the sample stage are adjustable. In order to facilitate the experimental operation, the coating machine is also equipped with an electric baffle, which can directly control the opening and closing of the baffle through the display screen. The coating machine is equipped with a 100W RF power supply. By manually switching the output lines, three target heads can share one power supply (not simultaneous), thereby enabling operation of plating multiple or multiple layers of membranes in a single experiment.

The device is compact and well designed and can be placed on the desktop, making it ideal for lab purchases.

This set of configuration does not contain a vacuum system, customers can choose the high vacuum system that meets the requirements according to your own needs.


Specifications

Product name Three-target RF magnetron sputtering coating machine

Product model CY-VTC-3RF

Supply voltage AC220V, 50Hz

RF power supply 0~100W continuously adjustable

Maximum power 200W

Chamber material stainless steel

Chamber size O.D.φ300mm x 300mm

Magnetron   sputtering head 3x2”

Magnetron target parameter Adjustable tilt angle 0~25°

The distance from the target to the sample stage is 50~80mm

Each target head is equipped with an electric baffle

Cooling method is water-cooled, need to be equipped with 10L/min water chiller

Sample stage parameters Size: φ185mm

Speed: 1~10rpm adjustable

Heating up to 500°C

Temperature control accuracy: ±1°C