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고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
3 Rotary Target Plasma Sputtering Coater with Substrate Heater
3 rotary target plasma sputtering coater is a
compact plasma thin film sputter (DC common type). The control panel adopts the
touch screen mode. The substrate has a limit of 2", the sample is placed
with a diameter of Ø50mm and the heating temperature is 500℃.3 rotary target
plasma sputtering coater can sputter gold, silver and copper targets, and
can not sputter light metals and carbon. This machine uses a rotating sample
stage to sequentially coat three layers on the same sample.The film is suitable
for the preparation of samples in the laboratory.
3 rotary target plasma sputtering coater
specifications:
Input Power |
|
Output Power |
1600 VDC,40 mA max |
Vacuum Chamber |
|
Sample Stage with Heater |
|
Control Panel |
|
Shield |
Stainless steel shield cage is
included for extra protection |
Sputtering Targets |
|
Dimensions |
440 mm L × 330 mm W × 455 mm
H |
Net Weight |
50 kg |
Warranty |
One year limited with lifetime
support |
Notes |
HIGH VOLTAGE! Sputtering heads connect to
high voltage. For safety, the operator must shut down the equipment before
sample loading and target changing operations This model is not suitable for coating
light metallic material such as Al, Mg, Zn, Ni, etc. due to low energy.
Please consider our magnetron sputtering coater or thermal evaporation
coater. |