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공정장비

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Compact 3 Sputter Heads Plasma Sputtering Coater with Rotary Stage CY-PSP180G-3TA-RS

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This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This model machine is also equipped with a rotatable sample stage, which can effectively improve the uniformity of the coating. This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments.

Technical parameters of plasma sputtering coater:

Product model

CY-PSP180G-3TA-RS

Sample stage

Size

100mm  

Rotating speed

1~20rpm adjustable

Plasma sputtering source

Quantity

2 inchesx3

Cooling method

Natural cooling

Vacuum chamber

Chamber size

φ180mm x 210mm   

Observation window

Omnidirectional visibility

Chamber material

High purity quartz

Open method

Top cover removable

Upper and lower cover material

304 stainless steel

Pumping port

KF16

Intake port

1/4 inch ferrule connector

Power configuration

Quantity

DC power supplyx1

Output power

Max. 150W

Sputtering power

1200V

Max. sputtering current

50mA

Vacuum system

Vacuum pump type

Dual-stage rotary vane vacuum pump

Pumping port

KF16

Exhaust interface

KF16

Pumping rate

1.1L/s（4m3/h）

Ultimate vacuum

≥0.1Pa

Vacuum measurement

Resistance vacuum gauge

Others

Power supply

AC 220V 50Hz

Total power

1.5kW

Dimension

500mm x 320mm x470mm

Weight

30kg