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공정장비

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High vacuum plasma sputter & thermal evaporation two-in-one coating machine

모델명 :
제품 견적문의

상품상세정보

The plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.

This vacuum chamber of coating machine is made of 304 stainless steel, and the coating process is completely visible. The instrument is equipped with two stage rotary vane vacuum pump, which can quickly reach the vacuum degree of 1.0E-3pa, Ultimate vacuum 1.0E-5Pa, and can meet the vacuum environment required by most evaporation coating experiments and diode sputtering experiments. This instrument has small size which can save space and can be used on the test bench. One machine has multiple purposes, which is cost-effective and very suitable for major universities and research institutions to choose.

Technical parameters of coating machine:

Model

CY-EVS180S-HV

Supply voltage

AC220V, 60Hz

Maximum power

1200W

Sample Stage

Diameter φ65mm;

Adjustable distance from evaporation source, adjustable range 60mm-100mm

Vacuum chamber

Material: 304 stainless steel O.Dφ168mm x I.Dφ160mm x 210mm

Maximum temperature

1700℃

Thermocouple

B type thermocouple

Vacuum gauge

Electronic vacuum gauge

Vacuum system

Backing pump: oil-free pump, pumping speed 30L / min

Secondary pump: pumping speed 90L / s

Vacuum interface

KF40

Intake port

1/4 card sleeve connector

Overall size

500x350x400mm