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공정장비

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Three target plasma sputtering coater

모델명 :
제품 견적문의

상품상세정보

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments.

 

Three target heads small plasma sputtering coater specifications:

Sample stage

Size

100mm  

Distance from sample stage to target surface

20~35mm height adjustable

Plasma sputtering source

Quantity

2 inchesx3

Cooling method

Natural cooling

Vacuum chamber

Chamber size

φ180mm x 210mm   

Observation window

Omnidirectional visibility

Chamber material

High purity quartz

Open method

Top cover removable

Upper and lower cover material

304 stainless steel

Pumping port

KF16

Intake port

1/4 inch ferrule connector

Power configuration

Quantity

DC power supplyx1

Output power

Max. 150W

Sputtering   power

1200V

Max. sputtering current

50mA

Vacuum system

Vacuum pump type

Dual-stage rotary vane vacuum pump

Pumping port

KF16

Exhaust interface

KF16

Pumping rate

1.1L/s(4m3/h)

Ultimate vacuum

≥0.1Pa

Vacuum measurement

Resistance vacuum gauge

Others

Power supply

AC 220V 50Hz

Total power

1.5kW

Dimension

500mm x 320mm x470mm

Weight

30kg