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고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
MPCVD grown diamond deposition equipment
Application
Preparation of high-quality single crystal
diamond;
Preparation of high-quality polycrystalline
free-standing diamond films;
Preparation of high quality polycrystalline
diamond films;
Preparation of various carbon nano films
such as graphene, carbon nanotubes, fullerenes and diamond films.
Features
a. Stainless
steel cavity type 6kw microwave plasma equipment, high power density;
b. The
water-cooled substrate stage and the water-cooled metal chamber ensure the
system can work stably for a long time;
c. The
substrate temperature is achieved by microwave plasma self-heating;
d. The
vacuum measuring instrument adopts a full-range vacuum gauge, which can
accurately measure the background vacuum and working gas pressure;
e. The
vacuum pump and valve adopt turbo molecular pump (the ultimate vacuum is 1×10-5Pa)
and the rotary vane mechanical vacuum pump (the ultimate vacuum is 1Pa), and
the system can automatically control the deposition pressure;
f. Cooling
water circulation system to ensure long-term safe and stable operation of the
device under high power;
g. 15-inch
touch screen, PLC automatic control, can set the temperature or pressure to be
constant, can save and reuse up to 20 sets of process files;
Fully automatic process control module,
which can stably and reliably prepare high-quality diamond films and crystals
Technical specifications
Microwave system (Sairem microwave source, France) |
microwave frequency |
2450±25MHz |
output power |
0.6kw~6kw continuous adjustable |
|
Microwave tuning |
3-stub tuner Mode conversion antenna |
|
Microwave reflection protection |
Circular,Water load |
|
Microwave operating mode |
TM013 |
|
microwave leak |
≤ 2 mw/cm2 |
|
vacuum system |
Operating pressure range |
10~250Torr |
Automatic pressure control |
40~250Torr |
|
Vacuum pump |
4.4L/s rotary-vane vacuum pump |
|
Vacuum integrity |
< 1.0x10-9 Pa
* m3 /sec (by Helium leak detector) |
|
Pressure holding capacity |
The pressure rise is less than 0.2 Torr
every 24 hours |
|
Ultimate vacuum |
0.1Pa(7.5 x10-4 Torr) |
|
Vacuum measurement |
Brand film gauge |
|
Vacuum reactor |
double-layer water-cooled stainless
steel |
|
Vacuum seal |
Metal seal + fluororubber ring seal
(load door) |
|
Reactor ID |
φ140mm |
|
Sample table window |
105x50mm Rectangular port, Front door sealed with Fluorine O-ring |
|
Watch window |
Two ports, CF35 large bore, 180 ° distribution |
|
Temperature measurement window |
The horizontal angle of the two
windows is 25~30°, 180° distribution; The window is convenient to detect
the temperature of the sample stage from the oblique angle of the
upper part of the reactor downward |
|
Sample stage |
Electric lift water-cooled substrate
platform φ100mm,Adjustable
height range 0~70mm |
|
When the diameter of molybdenum
substrate is ≥50mm, the plasma fireball can cover the whole substrate stage
at 5000W and 180torr |
||
Substrate temperature 250~1400℃ Depending on the process parameters |
||
Gas channel |
Flowmeter and flow control valve
imported from Japan |
|
system-provided 4-channel MFC |
||
4MFC maximum flow:H2: 1000sccm,CH4:100sccm,O2:20sccm,N2:2sccm |
||
Temperature measurement system |
German Raytek infrared temperature
measurement system, temperature range: 300 ~ 1300 ℃ |
|
Systems software |
15”touch screen with PLC control,
friendly user operating interface |
|
The system supports two levels of
users: engineer and operator, and provides user authority management function |
||
The system is equipped with automatic
protection such as water shortage, air shortage, power supply phase failure,
fireball jump, over temperature overload, ignition and so on |
||
Up to 10 sets of process recipes can be
set, each set has 40 rows of data, the production process is automatically
controlled by the process recipes, and the process data can be backed up and
exported via U disk |
||
The system comes with fully
automatic air extraction, ignition, heating, cooling and other preset
processes, easy for users to operate |
||
Fully automatic temperature
control and air pressure control greatly reduce the workload of system
operators |
System installation requirements
The following installation conditions are
provided by the customer:
1. Gas connection
a) Working gas path: users need to provide
four channels of CH4, H2, N2 and O2, the gas pressure is 0.2MPa, and the gas
purity is determined by the user according to the process requirements
b) Gas interface: 1/4"VCR
interface
2. Power supply
a) Power supply voltage: AC 380V (± 10%),
frequency 50 Hz, three-phase four wire, There is independent ground wire in the
room, the efficiency of grounding resistance is 4 Ω, and the maximum power is
20kW
b) It is recommended to reserve a separate
air switch on the wall 1 meter away from each equipment. The specification of
air switch is 4P32A and with leakage protection.
c) Before making any connections, the
electronic system in the system should be shut down.
3. Cooling water
Customers need to provide their own
industrial chillers:
a) Cooling capacity:10kw
b) Flow rate:>30L/min
c) Recommended inlet water temperature:20℃,maximum inlet water temperature<25℃
d) Inlet water pressure:≥5.0 kg/cm2 (or head>45 m)
e) System water inlet and outlet connection:φ19mm(pagoda joint)
f) In order to avoid problems caused by
corrosion, pure water is recommended
4. Compressed air demand for system
control
a) Compressed dry air (CDA): the system
needs to provide CDA gas path with gas pressure ≥ 0.4MPa.
b) Interface: φ 8 quick plug (pneumatic
quick plug)
5. Equipment exhaust
a) Customers need to prepare their own
exhaust channels, and the exhaust port of the equipment is connected to the
exhaust channel through the KF25 interface.
Check before acceptance
1. Vacuum leakage: the leakage rate of
vacuum chamber is less than 0.1torr/12h
2. Microwave leakage: the measured value is
less than 2MW/cm2 (when the microwave output is 5kW)
3. Water pipe leakage: make sure the water
pipe is not leaking
4. System test: the system can start and
run normally, and the plasma fireball is even and stable
Warranty
1.Grantee
period is 12 months from the date of acceptance of the system or 14 months from
date of shipment (Airwaybill date), whichever comes first.
2.The following
are not covered by warrantee:
a)Unauthorized modification of
hardware/software.
b)Improper operation which are not
mentioned in the user manual.
c)Consumable parts
3. Customers
need to ensure that the construction progress of public facilities such as gas,
electricity and water will not affect the installation and commissioning of the
equipment and the delay caused by this will not extend the warranty period.