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Laboratory cvd mos2 thin film preparation sliding two zone rtp tube furnace CY-O1200-50IIC-RTP

모델명 :

Application

1.Rapid Thermal Annealing,ion implantation annealing

2.Graphene CVD preparation, nanotube growthing

3.Rapid thermal oxidation,Rapid thermal Nitriding

4.Silicidation,diffusion,contact alloying,crystallization and densification

Model No.	CY-O1200-50IIC-RTP
Display	Two separately LED digital gauge
Limiting temperature	1150℃
Working temperature	≤1100℃
Heating rate	0-20℃/min
Heating Zone length	two heating zone 200+200mm constant temperature zone:200mm
Quartz tube diameter	OD50*1200mm
Temperature accuracy	± 1℃
Heating element	Alchrome
Thermal couple	K TYPE
Cooling method	Double layer structure with fan cooling
Temperature control	30 steps programmable PID control
Chamber material	Alumina fiber
Over-temperature alarm	Yes
Over-current alarm	Yes
Sealing flange	S.S vacuum flange
Cooling method	air forced cooling
Gas mixer	One way with Float Flow Controller
Main Power	4.5Kw
Working voltage	AC220V,50Hz