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고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
Mini high pressure tube furnace
CY-H1200-1L high pressure tube furnace is
mainly composed of three parts: heating system, high temperature and high
pressure furnace tube and pressure measurement and control system. It can
realize the three functions of automatic stamping, overpressure release and
automatic temperature control. It is also equipped with process software, which
can realize the whole collection of data during the sintering process, and
provide the most true and reliable basis for the analysis and research of experimental
data. The equipment can be widely used for high temperature and high pressure
processing of nano materials, high temperature and high pressure sintering of
special functional ceramics, and this high temperature and high pressure
modulation method is used to change the thermal properties and electrical
conductivity of the materials.
Mini high pressure tube furnace
technical parameters:
Item |
Detail |
Supply voltage |
AC220V/110V, 50Hz/60Hz |
Total power |
2KW |
Operating temperature |
≤1100℃ |
Heating rate |
Suggest 10℃/min |
Thermocouple type |
K-type thermocouple |
Furnace tube size |
O.D.φ60mm I.D φ25 xφ L. 600mm |
Furnace tube material |
Super high temperature alloy |
Sealing flange |
Pressure flange |
Pressure measurement |
Semiconductor pressure gauge |
Overvoltage protection |
Safety vent valve |
Heating zone |
Single heating zone 200mm |
Temperature control |
1) PID automatic control of heating rate,
cooling rate and holding time 2) PID control over temperature
protection and thermocouple failure protection 3) It has over-temperature protection
alarm function, so the equipment can run unattended 4) The temperature accuracy is ±1℃ (the difference between the
displayed temperature and the actual temperature) 5) AI-PID 30-segment process curve, can
store multiple 6) Temperature control accuracy ±1℃ |
Work pressure |
≤4Mpa @800℃ ≤2.5Mpa @900℃ ≤1.2Mpa @1000℃ ≤0.8Mpa @1100℃ |
Working gas |
Non-corrosive gases such as nitrogen,
argon, and oxygen |