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Mini CVD tube furnace for preparing graphene

모델명 :
제품 견적문의

상품상세정보

This CVD system is specially designed for graphene production, using a 1200℃ mini tube furnace, equipped with a high-precision mass flow meter and a thin-film vacuum gauge. Compared with the conventional Pirani resistance gauge, the reading of the thin film gauge is accurate and not affected by the type of gas, which is very suitable for the vacuum coating process. At the same time, the equipment is equipped with a combustible gas detection device, which is linked with a solenoid valve at the air outlet. Once there is a leakage, the solenoid valve can be closed to ensure safety.

This set of equipment has a small footprint and is very suitable for laboratory preparation of CVD.

Mini CVD tube furnace technical parameters:

1200℃ Mini Tube Furnace Parameters:

Supply voltage

AC220V, 50Hz

Maximum power

2KW

Heating zone

Single heating zone 200mm

Constant temperature zone length

100mm

Heating element

Heat-resistant alloy wire

Thermocouple

K type 

Operating temperature

≤1150℃

Heating rate

Suggest ≤10℃/min

Temperature control accuracy

±1℃

Temperature control method

AI-PID 30-segment process curve, with overheat and burnout protection

Furnace tube material

High purity quartz

Furnace tube size

φ50mm O.D x 450mm L

Vacuum pump

Mechanical pump, pumping speed 1.1L/s

Ultimate vacuum

5Pa

Three-channel mass flow meter parameters:

Valve type

Stainless steel needle valve

Number of gas paths

Three

Pressure range

0.05~0.3MPa

Range

Ar 0~500sccm

H2 0~200sccm

CH4 0~10sccm

Flow control range

±1.5%

Mixing tank volume

750mL

Gas path material

304 stainless steel

Pipe interface

6.35mm ferrule connector

Power supply

AC220V 50Hz