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RTP rapid annealing furnace CY-O1000-100I-T-RTP

모델명 : CY-O1000-100I-T-RTP
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This product is a rapid annealing furnace, heated by the halogen lamp, and can be used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitriding, silicidation, diffusion, compound semiconductor annealing, annealing after ion implantation, electrode alloying, crystallization and Densification, alloy melting point analysis, film deposition, etc.

The equipment is mainly composed of quartz vacuum chamber, vacuum pump unit, water cooling unit and control system. The control system adopts intelligent temperature control meter control and touch screen operation. Its digital parameter interface and automatic operation mode provide users with an excellent research and development platform. The furnace chamber uses a left-right sliding way, and the distance from the sample is flexibly adjustable.

The equipment is equipped with a dual stage rotary vane pump, which has the advantages of small size, low noise, and no oil pollution.

Technical parameters:

 

Model

CY-O1000-100I-T-RTP

Furnace tube specifications

Inner diameter 100mm, heating temperature zone 400mm, total length 550mm

Material: high purity quartz

Heating rate

0-200℃/s

Cooling rate

Above 200℃≤25min

Heating element

Halogen lamp

Vacuum interface

KF16

Intake port

Pagoda head, with 10mm outer diameter air hose

Flange specification

φ100 stainless steel vacuum method water cooling flange

Water cooling interface: φ10mm quick plug connector

Vacuum system

Dual stage rotary vane pump, pumping speed 1.1L/s

Ultimate vacuum: 10-1Pa

Temperature control system

Intelligent temperature control meter temperature control

With over-temperature protection

Temperature measurement: K-type thermocouple

Water chiller

Water tank capacity 9L, Max. lift head 10m

Intake port

φ10 Pagoda Head

Air release valve

Manual air release valve

Power requirements

220V 50Hz, 24kW

Dimensions

1200mm x 500mm x 480mm