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High Power Desktop Magnetron Plasma Sputtering Coater with 3 Rotary Target

모델명 : CY-VTC-3RF
  • - Chamber size
  • - Sample stage Size:
제품 견적문의

상품상세정보

The instrument is a three-target magnetron coating machine with three two-inch magnetron target heads. The tilt angle of the target head and the distance from the sample stage are adjustable. In order to facilitate the experimental operation, the coating machine is also equipped with an electric baffle, which can directly control the opening and closing of the baffle through the display screen. The coating machine is equipped with a 100W RF power supply. By manually switching the output lines, three target heads can share one power supply (not simultaneous), thereby enabling operation of plating multiple or multiple layers of membranes in a single experiment.

The device is compact and well designed and can be placed on the desktop, making it ideal for lab purchases.

This set of configuration does not contain a vacuum system, customers can choose the high vacuum system that meets the requirements according to your own needs.


Specifications

Product name

Three-target RF magnetron sputtering coating machine

Product model

CY-VTC-3RF

Supply voltage

AC220V, 50Hz

RF power supply

0~100W continuously adjustable

Maximum power

200W

Chamber material

stainless steel

Chamber size

O.D.φ300mm x 300mm

Magnetron   sputtering head

3x2”

Magnetron target parameter

Adjustable tilt angle 0~25°

The distance from the target to the sample stage is 50~80mm

Each target head is equipped with an electric baffle

Cooling method is water-cooled, need to be equipped with 10L/min water chiller

Sample stage parameters

Size: φ185mm

Speed: 1~10rpm adjustable

Heating up to 500°C

Temperature control accuracy: ±1°C