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RTP rapid annealing furnace

모델명 : CY-O1000-120I-T-RTP
  • - 작동 온도 : 0～500℃
  • - 전기로 튜브 길이 : 500mm
제품 견적문의

상품상세정보

The tube size of the RTP rapid annealing furnace is 120mm, which can directly place 4 inches of material. The reaction zone of the sample is in a closed quartz chamber, which greatly reduces the possibility of indirect contamination of the sample while completing the production process. The device is equipped with LCD high-definition touch screen, and the setting data experiment operation is all graphic interface. It is convenient and quick to operate, which can greatly improve your experiment efficiency. The equipment has reserved the quick interface for vacuum and air gases, and our vacuum system can be used together with the gas mixing system.



RTP rapid annealing furnace application range:


Rapid annealing furnace equipment can be used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitridation, silicidation, diffusion, compound semiconductor annealing, post-ion implantation annealing, electrode alloying, crystallization and densification, alloy melting point analysis, thin film deposition, and the like.



RTP rapid annealing furnace technical parameters:


Model

CY-O1000-120I-T-RTP

Furnace tube material

High purity quartz

Furnace tube diameter

120mm

Furnace tube length

500mm

Furnace chamber length

440mm

Heating zone length

400mm

Constant temperature zone

200mm

Operating temperature

0～500℃

Heating rate

Recommended 80℃/ s, fast heating rate 200℃/s

Cooling speed

More than 200℃≤25 min

Temperature control accuracy

±1℃

Temperature control mode

30 or 50 segment program temperature control

Display mode

LCD touch screen

Sealing method

304 stainless steel vacuum flange

Flange interface

1/4" ferrule connector (Ø8 pagoda-shape connector)

Vacuum

4.4E-3Pa

Power supply

AC:220V 50/60Hz