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Split type High Vacuum Dual-Target Magnetron Sputtering Coating Machine

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The dual-target magnetron sputtering coating machine is a cost-effective magnetron sputtering coating equipment independently developed by our company, featuring standardization, modularization, and customizability. The magnetron targets are available in 1-inch and 2-inch options, allowing customers to choose based on the size of the substrate to be coated. Equipped with two 500W DC power supplies, this machine is suitable for preparing metal films, and the two targets cater to the needs of multi-layer or multiple coating processes.

The coating machine is equipped with two high-precision mass flow controllers, and customers can customize up to four MFCs for gas paths to meet complex gas environment construction requirements. The instrument comes standard with an advanced turbo molecular pump set, capable of achieving an ultimate vacuum of 1.0E-5Pa. Additionally, other types of molecular pumps are available for selection. The gas path of the molecular pump is controlled by multiple solenoid valves, enabling the opening of the chamber and retrieval of samples without turning off the pump, significantly enhancing your work efficiency. Optionally, an all-in-one industrial control computer can be equipped to control the system, allowing for the majority of functions, such as the control of vacuum pump sets and sputtering power supplies, to be executed through computer programs, further boosting your experimental efficiency.

Application Range:
 The dual-target magnetron sputtering coating machine is suitable for preparing single-layer or multi-layer ferroelectric films, conductive films, alloy films, etc. Compared to similar equipment, it boasts a wide range of applications while being compact and easy to operate, making it an ideal device for preparing material films in laboratories.

Technical Specifications:
 Technical specifications of the dual-target magnetron sputtering coating machine:

Product name

Split type High Vacuum Dual-Target Magnetron Sputtering   Coating Machine

Product model

CY-MSV325-II-DCDC-SS

Power supply voltage

AC220V，50Hz

Complete power

6KW

System vacuum

≦5×10-4Pa

Sample stage

Dimensions

φ150mm

Heating temperature

≦600℃

Temperature control accuracy

±1℃

Adjustable speed

≦20rpm

Magnetic target gun

Target size

Diameter Φ50.8mm, thickness ≤3mm

Cooling mode

Circulating water cooling

Water flow size

Not less than 10L/Min

Quantity

2

Vacuum chamber

Cavity size

Diameter φ325mm, height 500mm

Cavity material

SUU304 stainless steel

Observation window

Diameter φ100mm

Opening method

Top opening

Gas control

1 mass flow meter is used to control the   Ar flow, with a range of 200SCCM

Vacuum system

Equipped with 1 molecular pump system,   gas pumping speed 600L/S

Film thickness measurement

Optional quartz crystal film thickness   meter, resolution 0.10 Å

Sputtering power supply

Equipped with DC power supply, power   500W*2

Control system

CYKY self-developed professional control   system

Equipment dimensions

540mm×540mm×1000mm

Equipment weight

145kg