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Single target DC magnetron sputtering coater

모델명 :
제품 견적문의

상품상세정보

Single target DC magnetron sputtering coater equipment is a cost-effective magnetron sputtering coating equipment independently researched and developed by our company. It has the characteristics of standardization, modularization and customization. Magnetron targets can be selected from 1 inch, 2 inches and 3 inches, and customers can choose according to the size of the plated substrate; The power supply is a 1500W high-power DC power supply, which can be used for high-energy metal sputtering coating. According to experimental requirements, DC or RF power supplies of other specifications can also be selected to achieve coating operations of various materials.

 

The coating instrument has two high-precision mass flow meters, and customers can customize the gas path of up to four mass flow meters if they have other requirements to meet the requirements of complex gas environment construction; The instrument is equipped with an advanced turbomolecular pump set as standard, and the ultimate vacuum can reach 1.0E-5Pa. At the same time, other types of molecular pumps are available for purchase. The molecular pump's gas path is controlled by multiple solenoid valves, which can open the cavity to take out samples without turning off the pump, which greatly improves your work efficiency. This product can be equipped with an integrated industrial control computer to control the system. The computer program can realize most functions such as the control of the vacuum pump group and the control of the sputtering power supply, which can further improve the efficiency of your experiment.

 

Application scope of single target magnetron sputtering coater:

 

Single target DC magnetron sputtering coater can be used to prepare single-layer ferroelectric films, conductive films, alloy films, etc. Compared with similar equipment, this single-target magnetron sputtering coating instrument is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material thin films, and is especially suitable for laboratory research on solid electrolytes and OLED etc.

Technical parameters of single target magnetron sputtering coater:

Single target DC magnetron sputtering   coating instrument

Sample stage

Dimensions

φ185mm

Heating range

Room temperature～500℃

Adjustable speed

1-20rpm adjustable

magnetic control target gun

Target plane

Circular plane target

Sputtering vacuum

10Pa～0.2Pa

Target diameter

50～50.8mm

Target thickness

2～5mm

Insulation voltage

>2000V

Cable specifications

SL-16

Target head temperature

≦65℃

real null Cavity body

Inner wall treatment

Electrolytic polishing

Cavity size

φ300mm × 300mm

Cavity material

304 stainless steel

Observation window

Quartz window, diameter φ100mm

Open method

Top opening, cylinder auxiliary support

gas body control system

Flow control

Mass flow meter, range 0～200SCCM argon gas

Control valve type

Solenoid valve

Control valve static state

Normally closed

Measuring linearity

±1.5%F.S

Measurement repeatability

±0.2%F.S

Measuring response time

≤8 second（T95）

Working pressure range

0.3MPa

Valve body pressure

3MPa

Working temperature

（5～45）℃

Body material

Stainless steel 316L

Valve body leakage rate

1×10-8Pa.m3/s

Pipe joints

1/4″Compression fitting

Input and output signal

0～5V

Power supply

±15V（±5%）（＋15V  50mA,  －15V  200mA）

Overall dimensions mm

130 (width) × 102 (height) × 28 (thickness)

Communication Interface

RS485 MODBUS protocol

DC power supply

Power

500W

Output voltage

0～600V

Timing length

65000 second

Start Time

1～10 second

Film thickness measurement

Power requirements

DC:5V（±10%）  Maximum current 400mA

Resolution

±0.03Hz(5-6MHz),0.0136Å / Measurement (aluminum)

Measurement accuracy

±0.5% thickness + 1 count

Measurement period

100mS～1S/time (can be set)

Measuring range

500,000 Å (aluminum)

Crystal frequency

6MHz

Communication Interface

  RS-232/485 serial interface

Display digits

8-digit LED display

Molecular pump

Molecular pump pumping speed

80L/S

Rated speed

65000rpm

Vibration value

≦0.1um

Start Time

≦4.5min

Downtime

<7min

Cooling method

Air-cooled

Cooling water temperature

≦37℃

Cooling water flow rate

1L/min

Installation direction

Vertical ±5°

Suction port

150CF

Exhaust connection

KF40

Fore pump

Pumping rate

1.1L/S(VRD-4)

Ultimate vacuum

5×10-2Pa

Power supply

AC:220V/50Hz

Power

400W

Noise

≦56db

Suction port

KF40

Exhaust connection

KF25

Release valve

Pneumatic and electronically   controlled air release valve is installed on the vacuum chamber

The ultimate vacuum of the whole machine

≦5×10-4Pa

Vacuum chamber boost rate

≦2.5Pa/h

Software system

1 set of monitoring and   management software

Test target

2 copper targets with a   diameter of 2 inches and a thickness of 3 mm