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Dual target upper sputtering DC RF magnetron sputtering coating machine

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Dual target upper sputtering DC RF magnetron sputtering coating machine

CY-MSＨ500-II-DCRF-SS is a special laboratory coating machine with two targets developed by our company. this magnetron sputtering coater machine is equipped with a DC power supply and a RF power supply. It can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

CY-MSP500S-DCRF-B is a special laboratory coating machine with two targets developed by our company. this magnetron sputtering coater machine is equipped with a DC power supply and a RF power supply. this magnetron sputtering coater machine can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

Features of magnetron sputtering coater:

a. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise;

b. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time;

c. This model adopts the layout of under target, the sample table is on the top, and the height with the target surface can be precisely adjusted by program, and can be rotated and heated, with excellent performance.

Technical parameters of magnetron sputtering coater:

Model

CY-MSＨ500-II-DCRF-SS

Input

AC220V，50Hz

Total power

6KW

Ultimate vacuum degree

5x10-4Pa

Sample table parameters

Size

150 Dia.

Height

70 mm adjustable

Heating

≤500℃

Rotation speed

1-20 rpm

Magnetron sputtering head parameters

Quantity

2-set，2-inch

Cooling mode

Water cooled，required flow rate10L/min

Water chiller

10L/min circulating water cooling

Vacuum chamber

Size

500mm Dia. × 490mm H

Material

Stainless steel

Watch window

100mm Dia.

Open mode

front opening door

Gas flow controller

1channel 200sccm Ar；

Vacuum pump

Molecular pump system pumping,600L/S

Film thickness gauge

Quartz vibrating film   thickness gauge ，

one set，Resolution 0.10 Å

Sputter power supply

DC power supply：one set，500W，for metal films

RF power supply：one set，500W，for non-metallic films

Operating mode

All-in-one computer operation

Overall dimensions

1090mm x 900mm x 1250mm

Total weight

350kg