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Dual target magnetron sputtering coater with reciprocating sample stage
Dual target magnetron sputtering coater
with reciprocating sample stage
CY-MSH500S-100F-II-DCRF-SS is a
laboratory magnetron sputtering coater with two target positions developed by
our company. this magnetron sputtering coater is equipped with a DC power
supply and a RF power supply, which can be used to prepare single or multilayer
ferroelectric film, conductive film, alloy film, semiconductor film, ceramic
film, dielectric film, optical film, etc.
CY-MSH500S-100F-II-DCRF-SS is a
laboratory-specific magnetron sputtering coater with two target positions
developed by our company. The magnetron sputtering coater equipment
is equipped with a DC power supply and a radio frequency power supply, which
can be used to prepare single or multilayer iron Electrical film, conductive
film, alloy film, semiconductor film, ceramic film, dielectric film, optical
film, etc.
Features of magnetron sputtering
coater:
a. Compared with ordinary plasma
sputtering, magnetron sputtering has the advantages of high energy and speed,
high coating rate, low sample temperature rise, and is a typical high-speed
low-temperature sputtering.
b. The magnetron sputter target is equipped
with a water-cooled interlayer. The water-cooled machine can effectively take
away the heat and avoid the heat accumulation on the target surface, so that
the magnetron sputter can work stably for a long time.
c. The sample stage adopts a reciprocating
design, and the left side is equipped with a magnetic coupling push rod, which
can push the sample stage left and right.
d. The whole machine adopts touch screen
control, built-in one-button coating program, easy to operate, it is an ideal
equipment for laboratory preparation of films
Technical parameters of magnetron
sputtering coater:
Model |
CY-MSH500S-100F-II-DCRF-SS |
|
Input |
AC220V,50Hz |
|
Total power |
6KW |
|
Ultimate vacuum degree |
5x10-4Pa |
|
Sample table parameters |
Size |
100mm x 100mm |
Reciprocating stroke |
200mm |
|
Magnetron sputtering head parameters |
Quantity |
2-set, 2-inch |
Cooling mode |
Water cooled, required flow rate10L/min |
|
Water chiller |
10L/min circulating water cooling |
|
Vacuum chamber |
Size |
φ500mm x 490mm H |
Material |
Stainless steel |
|
Watch window |
φ100mm |
|
Open mode |
front opening door |
|
Gas flow controller |
1channel 200sccm Ar; |
|
Vacuum pump |
Molecular pump system pumping 600L/S |
|
Film thickness gauge |
Quartz vibrating film thickness gauge,
one set, Resolution 0.10 Å |
|
Sputter power supply |
DC power supply: one set, 500W, for
preparing metal films RF power supply: one set, 500W, for non -
metallic coating |
|
Operating mode |
All-in-one computer operation |
|
Overall dimensions |
1090mm x 900mm x 1250mm |
|
Total weight |
350kg |