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고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
고객의 만족을 위하여 최선을 다하는 기업, 정문사이언스입니다.
Two zones CSS furnace with rotating wafer holder
Two zones CSS furnace with rotating
wafer holder
Two zones CSS furnace with rotating wafer
holder is an advanced rapid thermal processing furnace with 11" OD
quartz chamber and 5"×5" rotating sample holder. It is designed for
CSS (Close Spaced Sublimation) film coating up to 5" circular or
square wafer samples at working temperature of 800°C Max.
Two zones CSS furnace with rotating wafer
holder is heated by two group of halogen heaters (Top and Bottom) separately
with max. 10ºC/s heating rate. The top sample holder is rotatable to achieve
high uniformity coating. It is an excellent tool to research new generation
thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.
Two zones CSS furnace with rotating
wafer holder specifications:
Furnace structure |
|
Vacuum Flanges |
|
Heater and Sample Holder |
|
Temperature Controller |
|
Working Temperature |
Maximum temperature for each heater: ≤
800ºC. Maximum temperature difference between
two heaters: ≤ 300℃ depends on the spacing
between two heaters: Spacing 30mm Max. temp difference: 315℃ heating bottom only |
Heating & Cooling Rate |
Heating: < 8℃/s
( heating single heater only) Cooling: < 10℃/s
(600 - 100℃) Max. |
Thermal Couple |
Two K-type thermal couples are installed
on top and bottom heaters separately. |
Working Voltage |
208 - 240VAC, single phase, 50A air
breaker |
Power Requirement |
10 KW total |
Warranty |
One year limited with lifetime support
(Consumable parts such as quartz tube and heating lamps are not covered by
the warranty). |
Application Notes |
The tube furnaces with quartz tube are
designed for using under vacuum and low pressure < 0.2 bars /
3 psi / 0.02 Mpa. Vacuum pressures may only be safely used up to 1000°C. The
flow rate for gasses should be limited to < 200 SCCM (or 200
ml/min) for reducing thermal shocks to the tube. |