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3 Heads Compact 1” RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Op

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3 Heads Compact 1” RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option

CY-VTC-3RF is a three head 1" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.

Basic Info

  • Model NO.: CY-VTC-3RF
  • Structure: Desktop
  • Certification: CE, TUV
  • Type: Plasma
  • Transport Package: Ply Wooden Carton
  • HS Code: 8486109000
  • Customized: Customized
  • Material: Steel
  • Application: School, Lab
  • Trademark: CYKY
  • Origin: Zhengzhou, China

·         Product Description

·        

·         CY-VTC-3RF is a three head 1" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.

SPECIFICATIONS 

Input Power
 

·Single phase 220 VAC, 50 / 60 Hz
·1000 W (including vacuum pump and water chiller)

Power Source


  

·13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads
·Load range: 0 - 80 adjustable. Tuning range: -200j - 200j adjustable
·The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched "in the plasma" (no breaking of vacuum and plasma during a multilayer process)
·With a DC power supply, the coater can be easily modified into 1" DC sputtering sources for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations 
·Optional 300 W auto-match RF generator is available at extra cost   

Magnetron Sputtering Head
 

·Three 1" magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps
·RF cable replacement can be purchased at CYKY
·One manually operated shutter is built on the flange
·One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads

Sputtering Target

·Target size requirement: 1" diameter x 1/8" thickness max
·Sputtering distance range: 50 - 80 mm adjustable
·Sputtering angle range: 0 - 25° adjustable 
·1" diameter Cu target and Al2O3 target are included for demo testing
·Various oxide 1" sputtering targets are available upon request at extra cost
·For target bonding, 1 mm and 2 mm copper backing plates are included.

Vacuum Chamber

·Vacuum chamber:  256 mm OD x 238 mm ID x  276 mm Height, made of high purity quartz
·Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring
·Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber
·Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking 

Sample Holder

·Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover
·Sample holder size: 50 mm Dia. for. 2" wafer max
·Rotation speed: 1 - 10 rpm adjustable for uniform coating
·The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller

Vacuum Pump  

·KF40 vacuum port is built in for connecting to a vacuum pump.
·Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump
1.0E-5 Torr with optional turbo pump

Size

540 mm L x 540 mm W x 1000 mm H

Net Weight

60 kg

Compliance

CE approval

Warranty 

One years limited warranty with lifetime support