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High vacuum electron beam evaporation coating machine for Semiconductor thin film

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제품 견적문의

상품상세정보

High vacuum electron beam evaporation coating machine is used by electron beam evaporation coating equipment, mainly used for the preparation of various conductive film, semiconductor film, ferroelectric film, optical film, micro-nano device microprocessing, electron microscope sample pretreatment, etc., especially suitable for evaporation of various refractory metal materials. It can be used not only for hard substrates such as glass wafers and silicon wafers, but also for coating on flexible substrates such as PDMS, PTFE and PI.

Technical parameters of electron beam evaporation coating:

Product name

Electron beam evaporation coating mmachine

Product model

CY-EBH500-SS

Service condition

Ambient temperature ranged from 5 to 40℃

Source

Three phase 380V

Voltage

220V 50HZ

Power

<20 kW

Water gage

<2.5bar

Plated layer monitoring

Using SQM160 membrane thickness monitor, the inhomogeneity of coating   thickness is less than 6%.

Heat lamp

Four halogen heating lamps were used for degassing and one neon lamp   for lighting

The electrode interface

With a 2-way metal evaporation electrode interface, backup

Water cooling system

Water pressure monitoring

Observation window

100mm in diameter, with X-ray filter glass

Control system

Touch screen system

Vacuum chamber dimensions

Evaporation chamber dimensions: Φ 500 * H500mm

Electron gun

New electronic gun, a 6-hole crucible

Sample turntable

Sample size: <150mm, the sample table can rotate, the sample table   surface and the electron gun surface distance adjustment up and down, the   adjustment distance is 200mm-250mm, the sample table can be heated, heating   temperature <500℃.

System vacuum degree

A. Limit vacuum: baking for 12~24 hours, continuous pumping, vacuum   less than 5x10-5Pa

B. Extraction rate: a vacuum <5x10 in 40 minutes, starting from the   atmosphere-4Pa

C. System leakage rate: after 12 hours of shutdown, measure the vacuum   degree of the vacuum chamber is <10Pa

The vacuum unit

FB1200 Molecular pump + VRD-16 front stage pump + side extraction valve   + gate valve + cut-off valve + composite vacuum meter + coating monitoring   vacuum meter interface (standby)