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Compact vacuum chamber furnace with water cooling flange CY-1200X-H8

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Compact vacuum chamber furnace with water cooling flange CY-1200X-H8

CY-1200X-H8 is a CE standard vacuum crucible furnace. It is designed for laboratory calcining and annealing semiconductor wafer under vacuum or various protective gas. It equips a 7.5" ID x 13.4"L Quartz tube chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to achieve a vacuum of 10-2 to10-5 Torr through a mechanical or molecular vacuum pump.

Working voltage

AC220V,50/60Hz

Chamber structure

Swing side with water cooling flange

Display

LCD Touch Panel

Limited temper

1150℃

Working temper

Rm~1100℃

Heating rate

≤20℃/min(suggestion：10℃/min）

Chamber material

Quartz chamber：Φ200*340mm
Heating zone：Φ190*215mm

Heating element

Ni-Cr-Al heating wire

Thermcouple

K type

Accuracy

+/-0.1℃

Temper uniform

300-500℃:+/-5℃

Chamber capacity

6L

Control method

Digital PID control,30 steps“time-temperature”control

Over temper alarm

yes

Over current alarm

yes

Vacuum pump

Pumping speed：4m3/h
Limited vacuum degree：6.0*10-2Torr

Water cooling

10L/min

Working voltage

AC220V, 50Hz

Warranty

One year warranty with whole life technical supporting